Seong Keun Kim
TitleCited byYear
Resistive switching mechanism of thin films grown by atomic-layer deposition
BJ Choi, DS Jeong, SK Kim, C Rohde, S Choi, JH Oh, HJ Kim, CS Hwang, ...
Journal of applied physics 98 (3), 033715, 2005
11432005
High dielectric constant thin films on a Ru electrode grown at 250 C by atomic-layer deposition
SK Kim, WD Kim, KM Kim, CS Hwang, J Jeong
Applied Physics Letters 85 (18), 4112-4114, 2004
3032004
Al‐Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors
SK Kim, GJ Choi, SY Lee, M Seo, SW Lee, JH Han, HS Ahn, S Han, ...
Advanced Materials 20 (8), 1429-1435, 2008
2322008
First-principles study of point defects in rutile
E Cho, S Han, HS Ahn, KR Lee, SK Kim, CS Hwang
Physical Review B 73 (19), 193202, 2006
2242006
Low temperature (< 100 C) deposition of aluminum oxide thin films by ALD with O3 as oxidant
SK Kim, SW Lee, CS Hwang, YS Min, JY Won, J Jeong
Journal of The Electrochemical Society 153 (5), F69-F76, 2006
1602006
Capacitors with an equivalent oxide thickness of< 0.5 nm for nanoscale electronic semiconductor memory
SK Kim, SW Lee, JH Han, B Lee, S Han, CS Hwang
Advanced Functional Materials 20 (18), 2989-3003, 2010
1552010
Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant
SK Kim, CS Hwang, SHK Park, SJ Yun
Thin Solid Films 478 (1-2), 103-108, 2005
1442005
Atomic layer deposition of Ru thin films using 2, 4-(dimethylpentadienyl)(ethylcyclopentadienyl) Ru by a liquid injection system
SK Kim, SY Lee, SW Lee, GW Hwang, CS Hwang, JW Lee, J Jeong
Journal of The Electrochemical Society 154 (2), D95-D101, 2007
1072007
Atomic layer deposition for semiconductors
CS Hwang
Springer Science & Business Media, 2013
882013
Plasma-enhanced atomic layer deposition of TiO2 and Al-doped TiO2 films using N2O and O2 reactants
GJ Choi, SK Kim, SJ Won, HJ Kim, CS Hwang
Journal of the Electrochemical Society 156 (9), G138-G143, 2009
872009
Atomic Layer Deposition of SrTiO3 Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors
SW Lee, JH Han, S Han, W Lee, JH Jang, M Seo, SK Kim, C Dussarrat, ...
Chemistry of Materials 23 (8), 2227-2236, 2011
862011
Atomic-layer-deposited thin films with thin layers grown by in situ oxidation
SK Kim, CS Hwang
Journal of applied physics 96 (4), 2323-2329, 2004
812004
Chemically conformal ALD of SrTiO3 thin films using conventional metallorganic precursors
OS Kwon, SK Kim, M Cho, CS Hwang, J Jeong
Journal of The Electrochemical Society 152 (4), C229-C236, 2005
782005
Growth characteristics of atomic layer deposited TiO2 thin films on Ru and Si electrodes for memory capacitor applications
WD Kim, GW Hwang, OS Kwon, SK Kim, M Cho, DS Jeong, SW Lee, ...
Journal of The Electrochemical Society 152 (8), C552-C559, 2005
772005
Transformation of the crystalline structure of an ALD TiO2 film on a Ru electrode by O3 pretreatment
SK Kim, GW Hwang, WD Kim, CS Hwang
Electrochemical and solid-state letters 9 (1), F5-F7, 2006
682006
Giant electrode effect on tunnelling electroresistance in ferroelectric tunnel junctions
R Soni, A Petraru, P Meuffels, O Vavra, M Ziegler, SK Kim, DS Jeong, ...
Nature communications 5, 5414, 2014
652014
Growth Behavior of Al-Doped TiO2 Thin Films by Atomic Layer Deposition
SK Kim, GJ Choi, JH Kim, CS Hwang
Chemistry of Materials 20 (11), 3723-3727, 2008
622008
Atomic layer deposition of ZrO2 thin films with high dielectric constant on TiN substrates
SK Kim, CS Hwang
Electrochemical and Solid-State Letters 11 (3), G9-G11, 2008
612008
Influence of the oxygen concentration of atomic-layer-deposited films on the dielectric property and interface trap density
J Park, M Cho, SK Kim, TJ Park, SW Lee, SH Hong, CS Hwang
Applied Physics Letters 86 (11), 112907, 2005
592005
Investigation on the growth initiation of Ru thin films by atomic layer deposition
SK Kim, JH Han, GH Kim, CS Hwang
Chemistry of Materials 22 (9), 2850-2856, 2010
562010
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Articles 1–20