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Ann Witvrouw
Ann Witvrouw
Verified email at fys.kuleuven.be
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Cited by
Cited by
Year
The use of functionally graded poly-SiGe layers for MEMS applications
A Witvrouw, A Mehta
Materials science forum 492, 255-260, 2005
3842005
Keyhole-induced porosities in Laser-based Powder Bed Fusion (L-PBF) of Ti6Al4V: High-fidelity modelling and experimental validation
M Bayat, A Thanki, S Mohanty, A Witvrouw, S Yang, J Thorborg, NS Tiedje, ...
Additive Manufacturing 30, 100835, 2019
3282019
On the influence of laser defocusing in Selective Laser Melting of 316L
J Metelkova, Y Kinds, K Kempen, C de Formanoir, A Witvrouw, ...
Additive Manufacturing 23, 161-169, 2018
2312018
Experimental determination of the maximum post-process annealing temperature for standard CMOS wafers
S Sedky, A Witvrouw, H Bender, K Baert
IEEE transactions on Electron Devices 48 (2), 377-385, 2001
1862001
Viscosity and elastic constants of amorphous Si and Ge
A Witvrouw, F Spaepen
Journal of Applied Physics 74 (12), 7154-7161, 1993
1571993
Bulk and interface stresses in silver‐nickel multilayered thin films
JA Ruud, A Witvrouw, F Spaepen
Journal of applied physics 74 (4), 2517-2523, 1993
1531993
Fabrication and reliability testing of Ti/TiN heaters
P De Moor, A Witvrouw, V Simons, I De Wolf
Micromachining and Microfabrication Process Technology V 3874, 284-293, 1999
1521999
Comparison between wet HF etching and vapor HF etching for sacrificial oxide removal
A Witvrouw, B Du Bois, P De Moor, A Verbist, CA Van Hoof, H Bender, ...
Micromachining and Microfabrication Process Technology VI 4174, 130-141, 2000
1482000
Materials issues in the processing, the operation and the reliability of MEMS
A Witvrouw, HAC Tilmans, I De Wolf
Microelectronic Engineering 76 (1-4), 245-257, 2004
932004
Method for depositing polycrystalline sige suitable for micromachining and devices obtained thereof
K Baert, M Caymax, C Rusu, S Sedky, A Witvrouw
US Patent 7,176,111, 2007
772007
CMOS-MEMS integration: why, how and what?
A Witvrouw
Proceedings of the 2006 IEEE/ACM international conference on Computer-aided …, 2006
712006
Poly SiGe, a promising material for MEMS monolithic integration with the driving electronics
S Sedky, A Witvrouw, K Baert
Sensors and Actuators A: Physical 97, 503-511, 2002
662002
Creep as a reliability problem in MEMS
R Modlinski, A Witvrouw, P Ratchev, A Jourdain, V Simons, HAC Tilmans, ...
Microelectronics Reliability 44 (9-11), 1733-1738, 2004
592004
Creep characterization of Al alloy thin films for use in MEMS applications
R Modlinski, A Witvrouw, P Ratchev, R Puers, JMJ den Toonder, I De Wolf
Microelectronic engineering 76 (1-4), 272-278, 2004
512004
Determination of the plane stress elastic constants of thin films from substrate curvature measurements: Applications to amorphous metals
A Witvrouw, F Spaepen
Journal of applied physics 73 (11), 7344-7350, 1993
501993
Method for forming a hermetically sealed cavity
A Witvrouw, RH Rico, JP Celis
US Patent 8,062,497, 2011
492011
Poly-SiGe, a superb material for MEMS
A Witvrouw, M Gromova, A Mehta, S Sedky, P De Moor, K Baert, ...
MRS Online Proceedings Library (OPL) 782, A2. 1, 2003
492003
CMOS–MEMS integration today and tomorrow
A Witvrouw
scripta materialia 59 (9), 945-949, 2008
472008
Creep-resistant aluminum alloys for use in MEMS
R Modlinski, P Ratchev, A Witvrouw, R Puers, I De Wolf
Journal of Micromechanics and Microengineering 15 (7), S165, 2005
472005
New low-stress PECVD poly-SiGe layers for MEMS
C Rusu, S Sedky, B Parmentier, A Verbist, O Richard, B Brijs, L Geenen, ...
Journal of microelectromechanical systems 12 (6), 816-825, 2003
472003
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