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Giang T. Dang
Giang T. Dang
Verified email at canterbury.ac.nz - Homepage
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Cited by
Year
Successful growth of conductive highly crystalline Sn-doped α-Ga2O3 thin films by fine-channel mist chemical vapor deposition
T Kawaharamura, GT Dang, M Furuta
Japanese Journal of Applied Physics 51 (4R), 040207, 2012
1742012
Mist-CVD Grown Sn-Doped-Ga2O3MESFETs
GT Dang, T Kawaharamura, M Furuta, MW Allen
IEEE Transactions on Electron Devices 62 (11), 3640-3644, 2015
1112015
Bandgap engineering of α-(AlxGa1-x) 2O3 by a mist chemical vapor deposition two-chamber system and verification of Vegard's Law
GT Dang, T Yasuoka, Y Tagashira, T Tadokoro, W Theiss, ...
Applied Physics Letters 113 (6), 2018
782018
Metal-semiconductor field-effect transistors with In–Ga–Zn–O channel grown by nonvacuum-processed mist chemical vapor deposition
GT Dang, T Kawaharamura, M Furuta, MW Allen
IEEE Electron Device Letters 36 (5), 463-465, 2015
512015
Silver oxide Schottky contacts and metal semiconductor field-effect transistors on SnO2 thin films
GT Dang, T Uchida, T Kawaharamura, M Furuta, AR Hyndman, ...
Applied Physics Express 9 (4), 041101, 2016
422016
Zinc tin oxide metal semiconductor field effect transistors and their improvement under negative bias (illumination) temperature stress
GT Dang, T Kawaharamura, M Furuta, MW Allen
Applied Physics Letters 110 (7), 2017
352017
Electronic devices fabricated on mist-CVD-grown oxide semiconductors and their applications
GT Dang, MW Allen, M Furuta, T Kawaharamura
Japanese Journal of Applied Physics 58 (9), 090606, 2019
252019
α-(AlxGa1− x) 2O3 single-layer and heterostructure buffers for the growth of conductive Sn-doped α-Ga2O3 thin films via mist chemical vapor deposition
GT Dang, S Sato, Y Tagashira, T Yasuoka, L Liu, T Kawaharamura
APL Materials 8 (10), 2020
212020
Study on fabrication of conductive antimony doped tin oxide thin films (SnOx: Sb) by 3rd generation mist chemical vapor deposition
L Liu, T Kawaharamura, GT Dang, EKC Pradeep, S Sato, T Uchida, ...
Japanese Journal of Applied Physics 58 (2), 025502, 2019
212019
Atmospheric-pressure epitaxial growth technique of a multiple quantum well by mist chemical vapor deposition based on Leidenfrost droplets
T Kawaharamura, GT Dang, N Nitta
Applied Physics Letters 109 (15), 2016
202016
Stability of In-Ga-Zn-O metal-semiconductor field-effect-transistors under bias, illumination, and temperature stress
GT Dang, T Kawaharamura, M Furuta, S Saxena, MW Allen
Applied Physics Letters 107 (14), 2015
202015
Photoluminescence of an Al0. 5Ga0. 5As/GaAs multiple quantum well in the temperature range from 5 to 400 K
GT Dang, H Kanbe, M Taniwaki
Journal of Applied Physics 106 (9), 2009
182009
Conductive Si-doped α-(AlxGa1− x) 2O3 thin films with the bandgaps up to 6.22 eV
GT Dang, Y Tagashira, T Yasuoka, L Liu, T Kawaharamura
AIP Advances 10 (11), 2020
162020
Growth of α-Cr2O3 single crystals by mist CVD using ammonium dichromate
GT Dang, Y Suwa, M Sakamoto, L Liu, P Rutthongjan, S Sato, T Yasuoka, ...
Applied Physics Express 11 (11), 111101, 2018
152018
Growth mechanism of zinc oxide thin film by mist chemical vapor deposition via the modulation of [H2O]/[Zn] ratios
P Rutthongjan, M Nishi, L Liu, S Sato, Y Okada, GT Dang, ...
Applied Physics Express 12 (6), 065505, 2019
122019
Optical Characterization of Gallium Oxide α and β Polymorph Thin-Films Grown on c-Plane Sapphire
L Ghadbeigi, J Cooke, GT Dang, T Kawaharamura, T Yasuoka, R Sun, ...
Journal of Electronic Materials 50, 2990-2998, 2021
112021
Composition control of Zn1-xMgxO thin films grown using mist chemical vapor deposition
P Rutthongjan, L Liu, M Nishi, M Sakamoto, S Sato, EKC Pradeep, ...
Japanese Journal of Applied Physics 58 (3), 035503, 2019
112019
Challenges of fabrication of a large-area-uniform molybdenum disulfide layered thin film at low growth temperature by atmospheric-pressure solution-based mist CVD
S Sato, N Nitta, M Sakamoto, L Liu, P Rutthongjan, M Nishi, M Ueda, ...
Japanese Journal of Applied Physics 57 (11), 110306, 2018
82018
Nonlinear absorption and refraction of CdSe/ZnS quantum dots at two-photon resonant excitation of excitons
EZ V. Dneprovskii, D. Kabanin, V. Lyaskovskii, A
Physica Status Solidi c 5 (7), 2507, 2008
82008
The effect of HCl on the α-Ga2O3 thin films fabricated by third generation mist chemical vapor deposition
T Yasuoka, L Liu, T Ozaki, K Asako, Y Ishikawa, M Fukue, GT Dang, ...
AIP Advances 11 (4), 2021
72021
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