An analytical investigation of pad wear caused by the conditioner in fixed abrasive chemical–mechanical polishing NY Nguyen, ZW Zhong, Y Tian The International Journal of Advanced Manufacturing Technology 77, 897-905, 2015 | 30 | 2015 |
Modeling and simulation for the distribution of slurry particles in chemical mechanical polishing NY Nguyen, Y Tian, ZW Zhong The International Journal of Advanced Manufacturing Technology 75 (1-4), 97-106, 2014 | 29 | 2014 |
Analysis and improvement of the pad wear profile in fixed abrasive polishing NY Nguyen, ZW Zhong, YB Tian The International Journal of Advanced Manufacturing Technology 85, 1159-1165, 2016 | 16 | 2016 |
The impact of population growth on the future air traffic demand in Singapore SM Phyoe, NY Nguyen, S Aneeka, ZW Zhong International Conference on Computer Networks and Communication Technology …, 2016 | 10 | 2016 |
Improvement of the pad wear shape in fixed abrasive chemical-mechanical polishing for manufacturing optical components NY Nguyen, YB Tian, ZW Zhong International Conference on Optical and Photonic Engineering (icOPEN 2015 …, 2015 | 1 | 2015 |
Computational analysis and chemical mechanical polishing for manufacturing of optical components NY Nguyen | | 2017 |