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Anuja De Silva
Anuja De Silva
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Cited by
Cited by
Year
Nanoscale three-dimensional patterning of molecular resists by scanning probes
D Pires, JL Hedrick, A De Silva, J Frommer, B Gotsmann, H Wolf, ...
Science 328 (5979), 732-735, 2010
3782010
Molecular Glass Resists as High‐Resolution Patterning Materials
A De Silva, NM Felix, CK Ober
Advanced Materials 20 (17), 3355-3361, 2008
982008
Study of the Structure− Properties Relationship of Phenolic Molecular Glass Resists for Next Generation Photolithography
A De Silva, JK Lee, X André, NM Felix, HB Cao, H Deng, CK Ober
Chemistry of Materials 20 (4), 1606-1613, 2008
722008
Characterization of the photoacid diffusion length and reaction kinetics in EUV photoresists with IR spectroscopy
S Kang, W Wu, KW Choi, A De Silva, CK Ober, VM Prabhu
Macromolecules 43 (9), 4275-4286, 2010
542010
Fifteen nanometer resolved patterns in selective area atomic layer deposition—defectivity reduction by monolayer design
R Wojtecki, M Mettry, NF Fine Nathel, A Friz, A De Silva, N Arellano, ...
ACS applied materials & interfaces 10 (44), 38630-38637, 2018
492018
Phenolic molecular glasses as resists for next-generation lithography
X André, JK Lee, A De Silva, N Felix, CK Ober, HB Cao, H Deng, H Kudo, ...
Advances in Resist Materials and Processing Technology XXIV 6519, 1291-1300, 2007
482007
EUV patterning successes and frontiers
N Felix, D Corliss, K Petrillo, N Saulnier, Y Xu, L Meli, H Tang, A De Silva, ...
Extreme Ultraviolet (EUV) Lithography VII 9776, 480-486, 2016
392016
Hydroxyphenylbenzene derivatives as glass forming molecules for high resolution photoresists
A De Silva, CK Ober
Journal of Materials Chemistry 18 (16), 1903-1910, 2008
372008
Calix [4] resorcinarene Derivatives as High‐Resolution Resist Materials for Supercritical CO2 Processing
NM Felix, A De Silva, CK Ober
Advanced Materials 20 (7), 1303-1309, 2008
272008
Dissolution phenomena of phenolic molecular glass photoresist films in supercritical CO 2
NM Felix, A De Silva, CMY Luk, CK Ober
Journal of Materials Chemistry 17 (43), 4598-4604, 2007
272007
Investigation of mask absorber induced image shift in EUV lithography
M Burkhardt, A De Silva, J Church, L Meli, C Robinson, N Felix
Extreme Ultraviolet (EUV) Lithography X 10957, 232-250, 2019
252019
Software installation and condition data distribution via CernVM File System in ATLAS
A De Salvo, A De Silva, D Benjamin, J Blomer, P Buncic, A Harutyunyan, ...
Journal of Physics: Conference Series 396 (3), 032030, 2012
212012
Molecular glass resists for next generation lithography
A De Silva, N Felix, J Sha, JK Lee, CK Ober
Advances in Resist Materials and Processing Technology XXV 6923, 509-522, 2008
212008
Solid state NMR investigation of photoresist molecular glasses including blend behavior with a photoacid generator
DL VanderHart, VM Prabhu, A De Silva, NM Felix, CK Ober
Journal of Materials Chemistry 19 (18), 2683-2694, 2009
202009
Fundamentals of EUV resist-inorganic hardmask interactions
DL Goldfarb, M Glodde, A De Silva, I Sheshadri, NM Felix, K Lionti, ...
Advances in Patterning Materials and Processes XXXIV 10146, 35-47, 2017
192017
Molecular glass resists for EUV lithography
A De Silva, D Forman, CK Ober
Advances in Resist Technology and Processing XXIII 6153, 1257-1266, 2006
182006
Fundamentals of resist stochastics effect for single-expose EUV patterning
A De Silva, L Meli, DL Goldfarb, NM Felix
Extreme Ultraviolet (EUV) Lithography X 10957, 57-67, 2019
172019
Study of alternate hardmasks for extreme ultraviolet patterning
A De Silva, I Seshadri, A Arceo, K Petrillo, L Meli, B Mendoza, Y Yao, ...
Journal of Vacuum Science & Technology B 34 (6), 2016
172016
Defect detection strategies and process partitioning for SE EUV patterning
L Meli, K Petrillo, A De Silva, J Arnold, N Felix, C Robinson, B Briggs, ...
Extreme Ultraviolet (EUV) Lithography IX 10583, 87-103, 2018
162018
A comparison of the reaction-diffusion kinetics between model-EUV polymer and molecular-glass photoresists
S Kang, K Lavery, KW Choi, VM Prabhu, WL Wu, EK Lin, A De Silva, ...
Advances in Resist Materials and Processing Technology XXV 6923, 398-409, 2008
162008
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