| Effect of sound frequency and initial concentration on the sonochemical degradation of perfluorooctane sulfonate (PFOS) L Rodriguez-Freire, R Balachandran, R Sierra-Alvarez, M Keswani Journal of hazardous materials 300, 662-669, 2015 | 97 | 2015 |
| Effect of chemical structure on the sonochemical degradation of perfluoroalkyl and polyfluoroalkyl substances (PFASs) NA Fernandez, L Rodriguez-Freire, M Keswani, R Sierra-Alvarez Environmental Science: Water Research & Technology 2 (6), 975-983, 2016 | 96 | 2016 |
| Treatment of perfluorooctane sulfonic acid (PFOS) using a large-scale sonochemical reactor VL Gole, A Fishgold, R Sierra-Alvarez, P Deymier, M Keswani Separation and Purification Technology 194, 104-110, 2018 | 76 | 2018 |
| Integrated circuit packaging review with an emphasis on 3D packaging A Lancaster, M Keswani Integration 60, 204-212, 2018 | 72 | 2018 |
| Sonochemical degradation of perfluorinated chemicals in aqueous film-forming foams L Rodriguez-Freire, N Abad-Fernández, R Sierra-Alvarez, ... Journal of Hazardous Materials 317, 275-283, 2016 | 69 | 2016 |
| Sono-chemical treatment of per-and poly-fluoroalkyl compounds in aqueous film-forming foams by use of a large-scale multi-transducer dual-frequency based acoustic reactor VL Gole, R Sierra-Alvarez, H Peng, JP Giesy, P Deymier, M Keswani Ultrasonics Sonochemistry 45, 213-222, 2018 | 54 | 2018 |
| Megasonic cleaning of wafers in electrolyte solutions: Possible role of electro-acoustic and cavitation effects M Keswani, S Raghavan, P Deymier, S Verhaverbeke Microelectronic Engineering 86 (2), 132-139, 2009 | 52 | 2009 |
| Enhanced stripping of implanted resists S Raghavan, R Govindarajan, M Keswani US Patent 8,772,170, 2014 | 41 | 2014 |
| Understanding acoustic cavitation for sonolytic degradation of p-cresol as a model contaminant R Balachandran, Z Patterson, P Deymier, SA Snyder, M Keswani Chemosphere 147, 52-59, 2016 | 38 | 2016 |
| Control of sonoluminescence signal in deionized water using carbon dioxide S Kumari, M Keswani, S Singh, M Beck, E Liebscher, P Deymier, ... Microelectronic Engineering 88 (12), 3437-3441, 2011 | 34 | 2011 |
| Effect of non-ionic surfactants on transient cavitation in a megasonic field M Keswani, S Raghavan, P Deymier Ultrasonics sonochemistry 20 (1), 603-609, 2013 | 32 | 2013 |
| Characterization of transient cavitation in gas sparged solutions exposed to megasonic field using cyclic voltammetry M Keswani, S Raghavan, P Deymier Microelectronic engineering 102, 91-97, 2013 | 28 | 2013 |
| Fundamentals and applications of sonic technology DPR Thanu, M Zhao, Z Han, M Keswani Developments in Surface Contamination and Cleaning: Applications of Cleaning …, 2019 | 23 | 2019 |
| Effect of dissolved CO2 in de-ionized water in reducing wafer damage during megasonic cleaning in MegPie S Kumari, M Keswani, S Singh, M Beck, E Liebscher, LQ Toan, ... ECS Transactions 41 (5), 93, 2011 | 23 | 2011 |
| Megasonic cleaning of blanket and patterned samples in carbonated ammonia solutions for enhanced particle removal and reduced feature damage Z Han, M Keswani, S Raghavan IEEE transactions on semiconductor manufacturing 26 (3), 400-405, 2013 | 21 | 2013 |
| Use of urea-choline chloride eutectic solvent for back end of line cleaning applications DPR Thanu, S Raghavan, M Keswani Electrochemical and Solid-State Letters 14 (9), H358, 2011 | 21 | 2011 |
| Particulate science and technology in the engineering of slurries for chemical mechanical planarization S Raghavan, M Keswani, R Jia KONA Powder and Particle Journal 26, 94-105, 2008 | 21 | 2008 |
| Effect of Water Addition to Choline Chloride–Urea Deep Eutectic Solvent (DES) on the Removal of Post-Etch Resid ues Formed on Copper DPR Thanu, S Raghavan, M Keswani IEEE transactions on semiconductor manufacturing 25 (3), 516-522, 2012 | 20 | 2012 |
| Experimental and simulation investigations of acoustic cavitation in megasonic cleaning K Muralidharan, M Keswani, H Shende, P Deymier, S Raghavan, ... Emerging Lithographic Technologies XI 6517, 412-424, 2007 | 18 | 2007 |
| Fundamentals and applications of plasma cleaning DPR Thanu, ES Srinadhu, M Zhao, NV Dole, M Keswani Developments in surface contamination and cleaning: applications of cleaning …, 2019 | 17 | 2019 |
