XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films V Patil, K Agrawal, V Barhate, S Patil, A Mahajan Semiconductor Science and Technology 34 (3), 034004, 2019 | 15 | 2019 |
The effect of post-deposition annealing on the chemical, structural and electrical properties of Al/ZrO2/La2O3/ZrO2/Al high-k nanolaminated MIM capacitors SR Patil, VN Barhate, VS Patil, KS Agrawal, AM Mahajan Journal of Materials Science: Materials in Electronics 33 (14), 11227-11235, 2022 | 9 | 2022 |
Spectroscopic study of La2O3 thin films deposited by indigenously developed plasma-enhanced atomic layer deposition system V Barhate, K Agrawal, V Patil, S Patil, A Mahajan International Journal of Modern Physics B 32 (19), 1840074, 2018 | 9 | 2018 |
Performance enhancement of Al/La2O3/ZrO2/4H–SiC MOS device with LaON as interfacial passivation layer * Viral N. Barhate a , Khushabu S. Agrawal a,b , Vilas S. Patil a,b , Sumit ... Materials Science in Semiconductor Processing 117, 105161, 2020 | 4 | 2020 |
Investigation of PEALD ZrO2/La2O3-based high-k nanolaminates sandwiched between Al and Ti electrodes for MIM capacitors SR Patil, VY Borokar, M Rasadujjaman, J Zhang, SJ Ding, AM Mahajan Journal of Materials Science: Materials in Electronics 34 (16), 1284, 2023 | 2 | 2023 |
Investigation of electrical properties of peald-deposited Ti/Al2O3/Al/Si MIM capacitors S Patil, V Barhate, A Mahajan, H Xu, M Rasadujjaman, J Zhang International Journal of Modern Physics B 35 (14n16), 2140045, 2021 | 2 | 2021 |