| Enzyme-based logic analysis of biomarkers at physiological concentrations: AND gate with double-sigmoid “filter” response J Halámek, O Zavalov, L Halámková, S Korkmaz, V Privman, E Katz The Journal of Physical Chemistry B 116 (15), 4457-4464, 2012 | 53 | 2012 |
| Through-Cobalt Self Forming Barrier (tCoSFB) for Cu/ULK BEOL: A novel concept for advanced technology nodes T Nogami, BD Briggs, S Korkmaz, M Chae, C Penny, J Li, W Wang, ... 2015 IEEE International Electron Devices Meeting (IEDM), 8.1. 1-8.1. 4, 2015 | 23 | 2015 |
| Ceria-based slurries for non-prestonian removal of silicon dioxide films S Korkmaz, SV Babu ECS Journal of Solid State Science and Technology 4 (2), P36, 2014 | 22 | 2014 |
| Two-input enzymatic logic gates made sigmoid by modifications of the biocatalytic reaction cascades O Zavalov, V Bocharova, J Halamek, L Halámková, S Korkmaz, ... arXiv preprint arXiv:1305.5929, 2013 | 18 | 2013 |
| Light scattering model for individual sub-100-nm particle size determination in an evanescent field P Khajornrungruang, S Korkmaz, P Angshuman, K Suzuki, K Kimura, ... Japanese Journal of Applied Physics 55 (6S3), 06JG02, 2016 | 15 | 2016 |
| AFM-based study of the interaction forces between ceria, silicon dioxide and polyurethane pad during non-Prestonian polishing of silicon dioxide films S Korkmaz, AS Vahdat, O Trotsenko, S Minko, SV Babu ECS Journal of Solid State Science and Technology 4 (11), P5016, 2015 | 15 | 2015 |
| Reactive liquids for non–prestonian chemical mechanical polishing of polysilicon films URK Lagudu, S Korkmaz, A Gowda, NK Penta, SV Babu ECS Journal of Solid State Science and Technology 8 (5), P3040, 2019 | 7 | 2019 |
| Non-prestonian RRs of poly-Si and SiO2 films and effect of residual stress on RRs of various types of SiO2 and Si3N4 films: a dissertation S Korkmaz Clarkson University, 2017 | 1 | 2017 |
| Over-sculpted storage node DD Shreeram, S Sapra, K Li, S Korkmaz US Patent App. 17/944,649, 2024 | | 2024 |
| Capacitors with electrodes having a portion of material removed, and related semiconductor devices, systems, and methods DD Shreeram, K Li, MN Rocklein, WC Huang, PC Hsu, S Korkmaz, ... US Patent App. 17/647,902, 2022 | | 2022 |
| Semiconductor processing applying supercritical drying S Korkmaz, S Sapra, JA Imonigie, AS Vahdat US Patent 11,127,588, 2021 | | 2021 |
| Semiconductor structure patterning S Korkmaz, DD Shreeram, S Balakrishnan, D Ray, S Sapra, PA Paduano US Patent 11,011,521, 2021 | | 2021 |
| Oxidative trim MN Rocklein, AJB Cheng, FD Fishburn, S Korkmaz, PA Paduano US Patent 10,985,239, 2021 | | 2021 |
| Formation of a capacitor using a sacrificial layer DD Shreeram, S Korkmaz, J Li, S Sapra, D Ray US Patent 10,964,475, 2021 | | 2021 |
S.V. BabuClarkson UniversityVerified email at clarkson.edu
