George Kokkoris
George Kokkoris
Institute of Nanoscience & Nanotechnology, NCSR Demokritos
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Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials
E Gogolides, V Constantoudis, G Kokkoris, D Kontziampasis, K Tsougeni, ...
Journal of Physics D: Applied Physics 44 (17), 174021, 2011
All-plastic, low-power, disposable, continuous-flow PCR chip with integrated microheaters for rapid DNA amplification
D Moschou, N Vourdas, G Kokkoris, G Papadakis, J Parthenios, ...
Sensors and Actuators B: Chemical 199, 470-478, 2014
A global model for C4F8 plasmas coupling gas phase and wall surface reaction kinetics
G Kokkoris, A Goodyear, M Cooke, E Gogolides
Journal of Physics D: Applied Physics 41 (19), 195211, 2008
Etching of and Si in fluorocarbon plasmas: A detailed surface model accounting for etching and deposition
E Gogolides, P Vauvert, G Kokkoris, G Turban, AG Boudouvis
Journal of Applied Physics 88 (10), 5570-5584, 2000
A global model for SF6 plasmas coupling reaction kinetics in the gas phase and on the surface of the reactor walls
G Kokkoris, A Panagiotopoulos, A Goodyear, M Cooke, E Gogolides
Journal of Physics D: Applied Physics 42 (5), 055209, 2009
Simulation of and Si feature etching for microelectronics and microelectromechanical systems fabrication: A combined simulator coupling modules of surface …
G Kokkoris, A Tserepi, AG Boudouvis, E Gogolides
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 22 (4 …, 2004
Dual nanoscale roughness on plasma-etched Si surfaces: Role of etch inhibitors
G Kokkoris, V Constantoudis, P Angelikopoulos, G Boulousis, ...
Physical Review B 76 (19), 193405, 2007
Multiscale modeling in chemical vapor deposition processes: Coupling reactor scale with feature scale computations
N Cheimarios, G Kokkoris, AG Boudouvis
Chemical engineering science 65 (17), 5018-5028, 2010
Plasma directed assembly and organization: bottom-up nanopatterning using top-down technology
N Vourdas, D Kontziampasis, G Kokkoris, V Constantoudis, A Goodyear, ...
Nanotechnology 21 (8), 085302, 2010
Si etching in high-density SF6 plasmas for microfabrication: surface roughness formation
E Gogolides, C Boukouras, G Kokkoris, O Brani, A Tserepi, ...
Microelectronic engineering 73, 312-318, 2004
A passive micromixer for enzymatic digestion of DNA
VE Papadopoulos, IN Kefala, G Kaprou, G Kokkoris, D Moschou, ...
Microelectronic Engineering 124, 42-46, 2014
Integrated framework for the flux calculation of neutral species inside trenches and holes during plasma etching
G Kokkoris, AG Boudouvis, E Gogolides
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 24 (6 …, 2006
Plasma nanotextured polymeric surfaces for controlling cell attachment and proliferation: A short review
A Tserepi, E Gogolides, A Bourkoula, A Kanioura, G Kokkoris, PS Petrou, ...
Plasma chemistry and plasma processing 36 (1), 107-120, 2016
Minimum energy paths of wetting transitions on grooved surfaces
G Pashos, G Kokkoris, AG Boudouvis
Langmuir 31 (10), 3059-3068, 2015
Plasma etching of poly (dimethylsiloxane): Roughness formation, mechanism, control, and application in the fabrication of microfluidic structures
ME Vlachopoulou, G Kokkoris, C Cardinaud, E Gogolides, A Tserepi
Plasma Processes and Polymers 10 (1), 29-40, 2013
A continuous flow μPCR device with integrated microheaters on a flexible polyimide substrate
E Mavraki, D Moschou, G Kokkoris, N Vourdas, S Chatzandroulis, ...
Procedia Engineering 25, 1245-1248, 2011
Etching of features in fluorocarbon plasmas: Explanation and prediction of gas-phase-composition effects on aspect ratio dependent phenomena in trenches
G Kokkoris, E Gogolides, AG Boudouvis
Journal of applied physics 91 (5), 2697-2707, 2002
Characterization and global modelling of low-pressure hydrogen-based RF plasmas suitable for surface cleaning processes
N Škoro, N Puač, S Lazović, U Cvelbar, G Kokkoris, E Gogolides
Journal of Physics D: Applied Physics 46 (47), 475206, 2013
Line-edge-roughness transfer during plasma etching: modeling approaches and comparison with experimental results
V Constantoudis, G Kokkoris, P Xydi, E Gogolides, E Pargon, M Martin
Journal of Micro/Nanolithography, MEMS, and MOEMS 8 (4), 043004, 2009
Formation and metrology of dual scale nano-morphology on SF6 plasma etched silicon surfaces
G Boulousis, V Constantoudis, G Kokkoris, E Gogolides
Nanotechnology 19 (25), 255301, 2008
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