| A compact laser-driven plasma accelerator for megaelectronvolt-energy neutral atoms R Rajeev, T Madhu Trivikram, KPM Rishad, V Narayanan, ... Nature Physics 9 (3), 185-190, 2013 | 99 | 2013 |
| RESCAN: an actinic lensless microscope for defect inspection of EUV reticles I Mochi, P Helfenstein, I Mohacsi, R Rajeev, D Kazazis, S Yoshitake, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (4), 041003-041003, 2017 | 36 | 2017 |
| A Thomson parabola ion imaging spectrometer designed to probe relativistic intensity ionization dynamics of nanoclusters R Rajeev, KPM Rishad, TM Trivikram, V Narayanan, M Krishnamurthy Review of Scientific Instruments 82 (8), 2011 | 33 | 2011 |
| Beam drift and partial probe coherence effects in EUV reflective-mode coherent diffractive imaging P Helfenstein, R Rajeev, I Mochi, A Kleibert, CAF Vaz, Y Ekinci Optics Express 26 (9), 12242-12256, 2018 | 27 | 2018 |
| Time-resolved photoelectron imaging with a femtosecond vacuum-ultraviolet light source: Dynamics in the A∼/B∼-and F∼-bands of SO2 V Svoboda, NB Ram, R Rajeev, HJ Wörner The Journal of chemical physics 146 (8), 2017 | 27 | 2017 |
| Photoionization of clusters in intense few-cycle near infrared femtosecond pulses SR Krishnan, R Gopal, R Rajeev, J Jha, V Sharma, M Mudrich, ... Physical Chemistry Chemical Physics 16 (19), 8721-8730, 2014 | 27 | 2014 |
| Direct, Absolute, and In Situ Measurement of Fast Electron Transport via Cherenkov Emission H Habara, K Ohta, KA Tanaka, GR Kumar, M Krishnamurthy, S Kahaly, ... Physical review letters 104 (5), 055001, 2010 | 25 | 2010 |
| Scanning coherent diffractive imaging methods for actinic extreme ultraviolet mask metrology P Helfenstein, I Mohacsi, R Rajeev, Y Ekinci Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 034006-034006, 2016 | 23 | 2016 |
| Towards a stand-alone high-throughput EUV actinic photomask inspection tool: RESCAN R Rajendran, I Mochi, P Helfenstein, I Mohacsi, S Redford, A Mozzanica, ... Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017 | 22 | 2017 |
| Towards a stand-alone high-throughput EUV actinic photomask inspection tool: RESCAN R Rajendran, I Mochi, P Helfenstein, I Mohacsi, S Redford, A Mozzanica, ... Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017 | 22 | 2017 |
| Calibration status and plans for the charge integrating JUNGFRAU pixel detector for SwissFEL S Redford, A Bergamaschi, M Brückner, S Cartier, R Dinapoli, Y Ekinci, ... Journal of Instrumentation 11 (11), C11013, 2016 | 21 | 2016 |
| Bacterial cells enhance laser driven ion acceleration M Dalui, M Kundu, TM Trivikram, R Rajeev, K Ray, M Krishnamurthy Scientific reports 4 (1), 6002, 2014 | 20 | 2014 |
| A bright point source of ultrashort hard x-ray pulses using biological cells M Krishnamurthy, S Mondal, AD Lad, K Bane, S Ahmed, V Narayanan, ... Optics Express 20 (5), 5754-5761, 2012 | 20 | 2012 |
| Decrypting the charge-resolved kinetic-energy spectrum in the Coulomb explosion of argon clusters R Rajeev, KPM Rishad, TM Trivikram, V Narayanan, T Brabec, ... Physical Review A 85 (2), 023201, 2012 | 20 | 2012 |
| Actinic inspection of EUV reticles with arbitrary pattern design I Mochi, P Helfenstein, R Rajeev, S Fernandez, D Kazazis, S Yoshitake, ... International Conference on Extreme Ultraviolet Lithography 2017 10450, 28-37, 2017 | 19 | 2017 |
| Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging I Mochi, S Fernandez, R Nebling, U Locans, R Rajeev, A Dejkameh, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 19 (1), 014002-014002, 2020 | 17 | 2020 |
| Absorber and phase defect inspection on EUV reticles using RESCAN I Mochi, S Fernandez, R Nebling, U Locans, P Helfenstein, R Rajeev, ... Extreme Ultraviolet (EUV) Lithography X 10957, 211-218, 2019 | 16 | 2019 |
| Generation of energetic negative ions from clusters using intense laser fields R Rajeev, TM Trivikram, KPM Rishad, V Narayanan, M Krishnamurthy New Journal of Physics 15 (4), 043036, 2013 | 16 | 2013 |
| Anomalous ion charge distribution from cluster nanoplasmas TM Trivikram, R Rajeev, KPM Rishad, J Jha, M Krishnamurthy Physical review letters 111 (14), 143401, 2013 | 15 | 2013 |
| Scanning scattering contrast microscopy for actinic EUV mask inspection I Mohacsi, P Helfenstein, R Rajendran, Y Ekinci Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 13 | 2016 |
M KrishnamurthyProfessorVerified email at tifr.res.in
