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Chris A. Mack
Chris A. Mack
Lithoguru.com
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Title
Cited by
Cited by
Year
Fundamental principles of optical lithography: the science of microfabrication
C Mack
John Wiley & Sons, 2007
11802007
Fifty years of Moore's law
CA Mack
IEEE Transactions on semiconductor manufacturing 24 (2), 202-207, 2011
10032011
Development of positive photoresists
CA Mack
Journal of the Electrochemical Society 134 (1), 148, 1987
2721987
PROLITH: a comprehensive optical lithography model
CA Mack
Optical Microlithography IV 538, 207-220, 1985
2641985
Field guide to optical lithography
CA Mack
SPIE, 2006
1832006
Overlay metrology and control method
M Adel, M Ghinovker, E Kassel, B Golovanevsky, JC Robinson, CA Mack, ...
US Patent 7,804,994, 2010
1682010
Method for determining lithographic focus and exposure
W MIEHER, T DZIURA, A LEVY, C MACK, KLAT CORPORATION
WO Patent 2,003,001,297, 2003
161*2003
Inside PROLITH (TM): A Comprehensive Guide to Optical Lithography Simulation for the PROLITH Family of Lithography Simulation Tools, V5. 0
CA Mack
Finle Technologies, 1997
145*1997
Phase Phirst! An improved strong-PSM paradigm
D Levenson, JS Petersen, DJ Gerold, CA Mack
20th Annual BACUS Symposium on Photomask Technology 4186, 395-404, 2001
1052001
Generating random rough edges, surfaces, and volumes
CA Mack
Applied Optics 52 (7), 1472-1480, 2013
1032013
Analytical expression for the standing wave intensity in photoresist
CA Mack
Applied optics 25 (12), 1958-1961, 1986
991986
How to write a good scientific paper
CA Mack
(No Title), 2018
982018
Design and analysis of manufacturable alternating phase-shifting masks
RL Gordon, CA Mack, JS Petersen
18th Annual BACUS Symposium on Photomask Technology and Management 3546, 606-616, 1998
891998
Need for LWR metrology standardization: the imec roughness protocol
GF Lorusso, T Sutani, V Rutigliani, F Van Roey, A Moussa, AL Charley, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 17 (4), 041009-041009, 2018
852018
Reducing roughness in extreme ultraviolet lithography
CA Mack
Journal of Micro/Nanolithography, MEMS, and MOEMS 17 (4), 041006-041006, 2018
842018
Method for process optimization and control by comparison between 2 or more measured scatterometry signals
WD Mieher, CA Mack, M Hankinson
US Patent 7,352,453, 2008
842008
Absorption and exposure in positive photoresist
CA Mack
Applied Optics 27 (23), 4913-4919, 1988
821988
Statistical simulation of resist at EUV and ArF
JJ Biafore, MD Smith, CA Mack, JW Thackeray, R Gronheid, ...
Advances in Resist Materials and Processing Technology XXVI 7273, 1207-1216, 2009
732009
The impact of attenuated phase shift mask topography on hyper-NA lithography
CA Mack, MD Smith, T Graves
25th Annual BACUS Symposium on Photomask Technology 5992, 306-316, 2005
732005
New kinetic model for resist dissolution
CA Mack
Journal of the Electrochemical Society 139 (4), L35, 1992
711992
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