Chris C. Walton
Title
Cited by
Cited by
Year
Mega speaker identification (ID) system and corresponding methods therefor
N Dimitrova, D Li
US Patent App. 10/175,391, 2003
1512003
EUV multilayers for solar physics
DL Windt, S Donguy, JF Seely, B Kjornrattanawanich, EM Gullikson, ...
Optics for EUV, X-Ray, and Gamma-Ray Astronomy 5168, 1-11, 2004
872004
Advances in multilayer reflective coatings for extreme ultraviolet lithography
JA Folta, S Bajt, TW Barbee Jr, RF Grabner, PB Mirkarimi, TD Nguyen, ...
Emerging Lithographic Technologies III 3676, 702-709, 1999
741999
Optics for element-resolved soft X-ray magneto-optical studies
JB Kortright, M Rice, SK Kim, CC Walton, T Warwick
Journal of magnetism and magnetic materials 191 (1-2), 79-89, 1999
601999
Sub-70 nm extreme ultraviolet lithography at the advanced light source static microfield exposure station using the engineering test stand set-2 optic
P Naulleau, KA Goldberg, EH Anderson, D Attwood, P Batson, J Bokor, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002
552002
Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution
R Soufli, EA Spiller, MA Schmidt, C Davidson, RF Grabner, EM Gullikson, ...
Emerging Lithographic Technologies V 4343, 51-59, 2001
542001
Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography
R Soufli, RM Hudyma, E Spiller, EM Gullikson, MA Schmidt, JC Robinson, ...
Applied optics 46 (18), 3736-3746, 2007
522007
Evaluation of the capability of a multibeam confocal inspection system for inspection of EUVL mask blanks
AR Stivers, T Liang, MJ Penn, B Lieberman, GV Shelden, JA Folta, ...
22nd Annual BACUS Symposium on Photomask Technology 4889, 408-417, 2002
392002
Normal-incidence reflectance of optimized W/B 4 C x-ray multilayers in the range 1.4 nm< λ< 2.4 nm
DL Windt, EM Gullikson, CC Walton
Optics letters 27 (24), 2212-2214, 2002
332002
X-ray optical multilayers: microstructure limits on reflectivity at ultra-short periods
CC Walton, G Thomas, JB Kortright
Acta materialia 46 (11), 3767-3775, 1998
291998
A new approach to foam-lined indirect-drive NIF ignition targets
J Biener, C Dawedeit, SH Kim, T Braun, MA Worsley, AA Chernov, ...
Nuclear Fusion 52 (6), 062001, 2012
272012
Advances in low-defect multilayers for EUVL mask blanks
JA Folta, JC Davidson, CC Larson, CC Walton, PA Kearney
Emerging Lithographic Technologies VI 4688, 173-181, 2002
262002
Use of ion beams for protecting substrates from particulate defect contamination in ultra-low-defect coating processes
C Walton, J Folta
US Patent App. 10/254,119, 2004
252004
Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system
C Montcalm, RF Grabner, RM Hudyma, MA Schmidt, E Spiller, CC Walton, ...
Applied optics 41 (16), 3262-3269, 2002
252002
Effect of silica overlayers on laser damage of HfO2-SiO2 56 degrees incidence high reflectors
CC Walton, FY Genin, R Chow, MR Kozlowski, GE Loomis, EL Pierce
27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical …, 1996
251996
Boron–carbide barrier layers in scandium–silicon multilayers
AF Jankowski, CK Saw, CC Walton, JP Hayes, J Nilsen
Thin Solid Films 469, 372-376, 2004
242004
High sensitivity actinic detection of native defects on extreme ultraviolet lithography mask blanks
M Yi, T Haga, C Walton, J Bokor
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2001
242001
Tuning the rheological properties of sols for low-density aerogel coating applications
C Dawedeit, SH Kim, T Braun, MA Worsley, SA Letts, KJ Wu, CC Walton, ...
Soft Matter 8 (13), 3518-3521, 2012
222012
Extreme ultraviolet lithography: reflective mask technology
CC Walton, PA Kearney, PB Mirkarimi, JM Bowers, CJ Cerjan, AL Warrick, ...
Emerging lithographic technologies IV 3997, 496-507, 2000
222000
Spontaneously intermixed Al-Mg barriers enable corrosion-resistant Mg/SiC multilayer coatings
R Soufli, M Fernández-Perea, SL Baker, JC Robinson, J Alameda, ...
Applied Physics Letters 101 (4), 043111, 2012
212012
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