| Sub-5 nm patterning by directed self-assembly of oligo (dimethylsiloxane) liquid crystal thin films K Nickmans, JN Murphy, SAJ de Waal, P Leclère, J Doise, R Gronheid, ... Advanced Materials 28 (45), 10068-10072, 2016 | 73 | 2016 |
| Implementation of templated DSA for via layer patterning at the 7nm node R Gronheid, J Doise, J Bekaert, BT Chan, I Karageorgos, J Ryckaert, ... Alternative Lithographic Technologies VII 9423, 13-22, 2015 | 34 | 2015 |
| 28nm pitch single exposure patterning readiness by metal oxide resist on 0.33 NA EUV lithography D De Simone, L Kljucar, P Das, R Blanc, C Beral, J Severi, ... Extreme Ultraviolet (EUV) Lithography XII 11609, 43-53, 2021 | 31 | 2021 |
| Implementation of surface energy modification in graphoepitaxy directed self-assembly for hole multiplication J Doise, J Bekaert, BT Chan, R Gronheid, Y Cao, SE Hong, G Lin, ... Journal of Vacuum Science & Technology B 33 (6), 2015 | 27 | 2015 |
| Process optimization of templated DSA flows R Gronheid, J Bekaert, VKM Kuppuswamy, N Vandenbroeck, J Doise, ... Advances in Patterning Materials and Processes XXXI 9051, 87-93, 2014 | 25 | 2014 |
| N7 logic via patterning using templated DSA: implementation aspects J Bekaert, J Doise, R Gronheid, J Ryckaert, G Vandenberghe, G Fenger, ... Photomask Japan 2015: Photomask and Next-Generation Lithography Mask …, 2015 | 20 | 2015 |
| Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy J Bekaert, J Doise, VKM Kuppuswamy, R Gronheid, BT Chan, ... 30th European Mask and Lithography Conference 9231, 202-212, 2014 | 15 | 2014 |
| Strategies for increasing the rate of defect annihilation in the directed self-assembly of high-χ block copolymers J Doise, JH Koh, JY Kim, Q Zhu, N Kinoshita, HS Suh, PR Delgadillo, ... ACS applied materials & interfaces 11 (51), 48419-48427, 2019 | 13 | 2019 |
| Dual brush process for selective surface modification in graphoepitaxy directed self-assembly J Doise, BT Chan, M Hori, R Gronheid Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (3), 033503-033503, 2017 | 11 | 2017 |
| EUV patterned templates with grapho-epitaxy DSA at the N5/N7 logic nodes R Gronheid, C Boeckx, J Doise, J Bekaert, I Karageorgos, J Ruckaert, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 552-560, 2016 | 10 | 2016 |
| Influence of template fill in graphoepitaxy directed self-assembly J Doise, J Bekaert, BT Chan, SE Hong, G Lin, R Gronheid Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 031603-031603, 2016 | 8 | 2016 |
| Advances in defect performance in metal oxide photoresists for EUV lithography ST Meyers, J Doise, M Kocsis, SH Chang, BL Clark, P De Schepper, ... Extreme Ultraviolet (EUV) Lithography XII 11609, 116090K, 2021 | 7 | 2021 |
| Via patterning in the 7-nm node using immersion lithography and graphoepitaxy directed self-assembly J Doise, J Bekaert, BT Chan, M Hori, R Gronheid Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (2), 023506-023506, 2017 | 7 | 2017 |
| DSA graphoepitaxy calibrations for contact hole multiplication T Graves, AV Pret, S Robertson, M Smith, J Doise, J Bekaert, R Gronheid Advances in Patterning Materials and Processes XXXII 9425, 271-280, 2015 | 7 | 2015 |
| Development of high-chi directed self-assembly process based on key learning from PS-b-PMMA system HS Suh, G Mannaert, N Vandenbroeck, J Doise Advances in Patterning Materials and Processes XXXVIII 11612, 116120P, 2021 | 5 | 2021 |
| Integration of a templated directed self-assembly-based hole shrink in a short loop via chain P Rincon-Delgadillo, BT Chan, J Doise, M van der Veen, N Heylen, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (4), 043505-043505, 2016 | 5 | 2016 |
| Influence of template fill in graphoepitaxy DSA J Doise, J Bekaert, BT Chan, SE Hong, G Lin, R Gronheid Advances in Patterning Materials and Processes XXXIII 9779, 206-214, 2016 | 5 | 2016 |
| MOx resist formulation and process advances towards high-NA EUV lithography P De Schepper, B Cardineau, AK Narasimhan, L McQuade, J Doise, ... Advances in Patterning Materials and Processes XL 12498, 1249804, 2023 | 4 | 2023 |
| Defect mitigation in sub-20nm patterning with high-chi, silicon-containing block copolymers J Doise, G Mannaert, HS Suh, P Rincon, JH Koh, JY Kim, Q Zhu, ... Advances in Patterning Materials and Processes XXXVI 10960, 93-101, 2019 | 4 | 2019 |
| Influence of Homopolymer Addition in Templated Assembly of Cylindrical Block Copolymers J Doise, C Bezik, M Hori, JJ de Pablo, R Gronheid ACS nano 13 (4), 4073-4082, 2019 | 4 | 2019 |
